Research Article
Magnetic, Surface And Elemental Characterization of FECO (50:50, 70:30) 50nm Thin Film Grown By Ultra High Vacuum DC Magnetron Sputtering on Silicon (001) Substrate
@INPROCEEDINGS{10.4108/eai.7-12-2021.2314739, author={Mani GMK and Dhanalakshmi D}, title={Magnetic, Surface And Elemental Characterization of FECO (50:50, 70:30) 50nm Thin Film Grown By Ultra High Vacuum DC Magnetron Sputtering on Silicon (001) Substrate}, proceedings={Proceedings of the First International Conference on Combinatorial and Optimization, ICCAP 2021, December 7-8 2021, Chennai, India}, publisher={EAI}, proceedings_a={ICCAP}, year={2021}, month={12}, keywords={magnetic thin film feco vsm spin polarization}, doi={10.4108/eai.7-12-2021.2314739} }- Mani GMK
Dhanalakshmi D
Year: 2021
Magnetic, Surface And Elemental Characterization of FECO (50:50, 70:30) 50nm Thin Film Grown By Ultra High Vacuum DC Magnetron Sputtering on Silicon (001) Substrate
ICCAP
EAI
DOI: 10.4108/eai.7-12-2021.2314739
Abstract
Fe50Co50 and Fe70Co30(50nm) thin films prepared onto the Silicon (001) substrate at room temperature using UHV DC Magnetron Sputtering (PVD) system. We prepared FeCofilms and characterized their Magnetic, Topographic, Morphology and Elemental analysis using VSM, AFM, FESEM, and EDAX technique respectively. VSM result confirmed both materials are good magnetic in nature and both their Coercivity nearly 200Oe but Fe50Co50has higher magnetization when compared to Fe70Co30 film. From AFM results, the average roughness and root mean Square ofFe50Co50 film value are double the times higher than Fe70Co30film. From FESEM result Morphology of the Fe50Co50film like a columnar structure and Fe70Co30 as like columnar agglomeration structure. EDAX result revels high number of oxygen content present in Fe70Co30 film than Fe50Co50 film as well as no other impurities present in the film.
