Research Article
Nano Pyramid Anti–reflective Coating Design for Improved Thin-Silicon Photovoltaics
@INPROCEEDINGS{10.4108/eai.23-11-2022.2339154, author={Widya D. Putri and Gede W.P. Adhyaksa}, title={Nano Pyramid Anti--reflective Coating Design for Improved Thin-Silicon Photovoltaics }, proceedings={Proceedings of the International Conference on Sustainable Engineering, Infrastructure and Development, ICO-SEID 2022, 23-24 November 2022, Jakarta, Indonesia}, publisher={EAI}, proceedings_a={ICO-SEID}, year={2023}, month={12}, keywords={silicon photovoltaics anti--reflective coating si3n4 sio2 fdtd}, doi={10.4108/eai.23-11-2022.2339154} }- Widya D. Putri
Gede W.P. Adhyaksa
Year: 2023
Nano Pyramid Anti–reflective Coating Design for Improved Thin-Silicon Photovoltaics
ICO-SEID
EAI
DOI: 10.4108/eai.23-11-2022.2339154
Abstract
Process of converting light to electrical energy in photovoltaics (PVs) depends on sequential process from photon absorption - charge separation - charge collection. The total PV’s power-conversion efficiency on efficiency from each of these steps. In this study, we aim to improve photon absorption by minimizing reflection losses. For that, we design an anti–reflective coating (ARC) made by low index materials of pyramidal array geometry applied on thin-film silicon PVs. We utilize Finite Difference Time Domain (FDTD) method to determine reflection losses, optimize the design, and assess their limiting factors. We use index matching materials such as Si3N4 and SiO2 as ARC where we find the reflection loss can be as low as 3.4% from the total power of incident light. With careful geometrical tuning and combined with ease processing owned by SiO2, we believe this work open opportunities for further design and exploration for ARC for photovoltaics.
